電子工業用氣體統稱為電子氣。在大規模集成電路(LSI)、超大規模集成電路(VLSI)、半導體和電子器件生產與加工過程中,電子氣主要用于氣相外延生長、化學氣相淀積、摻雜(雜質擴散)、蝕刻、離子注入、濺射、退火、系統加壓、潔凈吹掃、吸氣覆蓋、氧化和還原等工藝。其中部分氣體直接作為半導體源,如硅源、硼源、磷源和CVD 源等等。
Oxygen in Tetrafluoromethane
4% O2/CF4
8% O2/CF4
17.5% O2/CF4
Standard Valve Outlet CGA580
Other DISS CGA connections are avaliable upon request.
Phosphine in Argon
1.0% PH3/Ar
2.0% PH3/Ar
5.0% PH3/Ar
10.0% PH3/Ar
15.0% PH3/Ar
Standard Valve Outlet CGA350
Manual and pneumatic DISS CGA connections are avaliable upon request.
Phosphine in Helium
1.0% PH3/He
2.0% PH3/He
10.0% PH3/He
Standard Valve Outlet CGA350
Manual and pneumatic DISS CGA connections are avaliable upon request.
Phosphine in Hydrogen
1.0% PH3/H2
5.0% PH3/H2
10.0% PH3/H2
15.0% PH3/H2
Standard Valve Outlet CGA350
Manual and pneumatic DISS CGA connections are avaliable upon request.
Phosphine in Nitrogen
1.0% PH3/N2
2.0% PH3/N2
3.0% PH3/N2
4.0% PH3/N2
5.0% PH3/N2
10.0% PH3/N2
15.0% PH3/N2
Standard Valve Outlet CGA350
Manual and pneumatic DISS CGA connections are avaliable upon request.
Silane in Argon
1.0% SiH4/Ar
2.0% SiH4/Ar
3.0% SiH4/Ar
4.0% SiH4/Ar
5.0% SiH4/Ar
10.0% SiH4/Ar
Standard Valve Outlet CGA350
Manual and pneumatic DISS CGA connections are avaliable upon request.
Silane in Hydrogen
1.0% SiH4/H2
2.0% SiH4/H2
3.0% SiH4/H2
4.0% SiH4/H2
5.0% SiH4/H2
10.0% SiH4/H2
Standard Valve Outlet CGA350
Manual and pneumatic DISS CGA connections are avaliable upon request.
Silane in Nitrogen
1.0% SiH4/N2
2.0% SiH4/N2
3.0% SiH4/N2
4.0% SiH4/H2
5.0% SiH4/N2
10.0% SiH4/N2
20.0% SiH4/N2
Standard Valve Outlet CGA350
Manual and pneumatic DISS CGA connections are avaliable upon request.
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